Plasma cleaning is an advanced surface treatment process that removes impurities and contaminants using energetic plasma or dielectric barrier discharge (DBD) plasma created from gaseous species. The system utilizes gases such as argon, oxygen, and mixtures including air and hydrogen/nitrogen. Plasma generation is achieved through high-frequency voltages (typically kHz to >MHz) to ionize low-pressure gas, with atmospheric pressure plasma systems also available.
This small vacuum plasma cleaning machine employs inductive coupling technology and delivers exceptional performance for insulating microwave tubes and components. It is specifically designed for handling sensitive products requiring high cleanliness standards and is suitable for processing plastic, biochemical materials, PDMS, glass, metal semiconductors, ceramics, composite materials, polymers, and various other materials. The system provides superior surface cleaning, sterilization, wettability enhancement, surface property modification, and improved binding force.
| Parameter | Specification |
|---|---|
| Vacuum Degree | 30Pa-100Pa |
| Gas Flow | 0-100ml/s |
| Cleaning Time | Adjustable (1-9999s) |
| Cooling Mode | Air Cooling |
| Gas Channels | Two-way working gas; Argon, hydrogen, oxygen, nitrogen, air, etc. |
| Control Systems | PLC + Touch Screen |
| Vacuum Cavity Temperature | <50℃ |
| Vacuum Pump | Oil pump/dry pump (optional) |
| Power Supply | AC220V(±10V) |
| Remarks | Specialized equipment can be customized for different material forms, sizes and production capacity |
The plasma cleaning system consists of five main components:
Plasma represents the fourth state of matter, alongside solid, liquid, and gas. This technology utilizes high-energy plasma particles to create physical and chemical reactions on material surfaces, enabling surface activation, etching, decontamination, and modification of surface properties including friction coefficient, adhesion, and hydrophilicity.
Introduces new functional groups including hydrocarbyl, amidogen, and carboxyl, significantly enhancing material surface activity and bonding capabilities.
Removes volatile gaseous substances generated by creating plasma with selected gases and surface materials. This reactive plasma process offers high etching rates and uniformity, with plasma parameters critically influencing etching effectiveness.
Contact angle measurement determines surface wettability: θ<90° indicates hydrophilic surface (smaller angles indicate better wettability), while θ>90° indicates hydrophobic surface.
Dyne value measurement assesses material surface bonding capability, with higher values indicating superior bonding performance for printing, coating, laminating, and welding applications.
Enhances surface bonding properties for improved adhesion and performance.
Removes oxide residue from electronic components, improving bond quality and enhancing connection reliability.
Effectively removes organic contaminants from glass surfaces for superior clarity and performance.
Comprehensive removal of oils and contaminants from metal surfaces for improved finishing and coating adhesion.
Cleaning and modification of graphene and other powder materials for enhanced material properties.
Surface activation for PDMS materials to improve bonding characteristics and material performance.
1-Year Comprehensive Warranty: Full technical support and troubleshooting during warranty period